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| 1 | EFFECT OF Ar PRESSURE ON STRUCTURAL AND ELECTRICAL PROPERTIES OF Cu FILMS DEPOSITED ON GLASS BY DC MAGNETRON SPUTTERING显示文摘Cu films with thickness of 630-1300nm were deposited on glass substrates withoutheating by DC magnetron sputtering in pure Ar gas. Ar pressure was controlled to0.5, 1.0 and 1.5Pa respectively. The target voltage was fixed at 500V but the targetcurrent increased from 200 to 1150mA with Ar pressure increasing. X-ray diffrac-tion, scanning electron microscopy and atomic force microscopy were used to observethe structural characterization of the films. The resistivity of the films was measuredusing four-point probe technique. At all the Ar pressures, the Cu films have mixturecrystalline orientations of [111], [200] and [220] in the direction of the film growth.The film deposited at lower pressure shows more [111] orientation while that depositedat higher pressure has more [220] orientation. The amount of larger grains in the filmprepared at 0.5Pa Ar pressure is slightly less than that prepared at 1. 0Pa and 1.5PaAr pressures. The resistivities of the films prepared at three different Ar pressures rep-resent few differences, about 3-4 times of that of bulk material. Besides the depositionrate increases with Ar pressure because of the increase in target current. The contri-bution of the bombardment of energetic reflected Argon atoms to these phenomena isdiscussed. | P. Wu F.P. Wang L.Q. Pan Y. Tian H. Qiu | 2002 | Acta Metallurgica Sinica(English Letters)2002，15，1： | 4 |
| 2 | Microstructure and corrosion resistance behavior of ceramic coatings on biomedical NiTi alloy prepared by micro-arc oxidation显示文摘 | J.L. Xu F. Liu F.P. Wang D.Z. Yu L.C. Zhao | 2008 | Applied Surface Science2008，，20： | 1 |
| 3 | Alumina coating formed on medical NiTi alloy by micro-arc oxidation显示文摘 | J.L. Xu F. Liu F.P. Wang L.C. Zhao | 2008 | Materials Letters2008，，25： | 1 |
| 4 | The corrosion resistance behavior of Al 2 O 3 coating prepared on NiTi alloy by micro-arc oxidation显示文摘 | J.L. Xu F. Liu F.P. Wang D.Z. Yu L.C. Zhao | 2008 | Journal of Alloys and Compounds2008，，1： | 1 |
| 5 | The inverse Hall–Petch effect in nanocrystalline ZrN coatings显示文摘 | Z.B. Qi P. Sun F.P. Zhu Z.C. Wang D.L. Peng C.H. Wu | 2011 | Surface & Coatings Technology2011，，12： | 1 |
| 6 | Reliability of high temperature solder alternatives显示文摘 | F.P. McCluskey M. Dash Z. Wang D. Huff | 2006 | Microelectronics Reliability2006，，9： | 1 |
| 7 | SPIN-DEPENDENT TUNNELING MAGNETORESISTANCE IN Fe-O/AlO_x/Fe-O FILMS显示文摘Fe- O/A1Ox /Fe-O tunnel junctions were prepared by reactive magnetron sputtering under mired working gas Ar+2%O2. The insulating AlOx layer of 1-2nm thickness was sputtered directly from Al2O3 target. Electrode layers were made of 80at. % iron and 20at.% oxygen. Bottom Fe-O electrode deposited on glass substrate annealed at 473K at the pressure of 3×10-4Pa for an hour shows disparate crystalline grain structure, lower electrical resistance and coercivity compared to the as-deposited top elect rode. Only crystalline structrure of a-Fe is observed in both electrodes. Large tunnel magneoresistance in large Fe-O/AlOx/Fe-O junctions of 1cm2 is observed at room temperature and the I-V characteristic curve of the junction shows that the barrier of the junction is of high quality. | L.Q. Pan, H. Qiu. F.P. Wang, P. Wu.Y’. Tian and S. Luo Department of Physics. University of Science and Technology Beijing, Beijing 100083, China Beijing Keda-Tianyu Microelectronic Materials Technology Development Co. Ltd., Rm 105 Keji Building. 30 Xueyu | 2002 | Acta Metallurgica Sinica(English Letters)2002，15，2： | 0 |
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