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11篇 您的检索式:作者名="PLACHETKA U"
    题名 作者 年代 出处 被引量
1? al, Fabrica?tion of inverse micro/nano pyramid structures using soft UV-NIL and wet chemical methods for residual layer removal and Si-etching显示文摘KimJ W Plachetka U Moormann c 2013Microelectronic Engineering2013,,:1
2Status and prospects of UV-nanoimprint technology 显示文摘BENDER M FUCHS A PLACHETKA U 2006Microelectron Eng2006,83,456789:1
3Nanowire Fin Field Effect Transistors via UV-Based Nanoimprint Lithography显示文摘FUCHS A BENDER M PLACHETKA U 2006Journal of Vacuum Science &Technology B2006,24,6:1
4Improved mold fabrication for the definition of high quality nanopat- tems by Soft UV-Nanoimprint lithography using diluted PDMS material显示文摘KOO N BENDER M PLACHETKA U 2007Microelectronic Engineering2007,84,58:1
5High resolution lithography with PDMS molds显示文摘BENDER M PLACHETKA U RAN J 2004J Va Sci Technol B2004,22,6:1
6Wafer scale patterning by soft UV-Nanoimprint lithography 显示文摘PLACHETKA U BENDER M FUCHS A 2004Microelectronic Engineering2004,7374,:1
7Improved mold fabrication for the definition of high quality nanopatterns by Soft UV - Nanoimprint lithography using diluted PDMS material 显示文摘Koo N Bender M Plachetka U 2007Microelectronic Engineering2007,84,:1
8Improved mold fabrication for the definition of high quality nanopatterns by Soft UV -Nanoimprint lithography using diluted PDMS material 显示文摘Koo N Bender M Plachetka U 2007Microelectronic Engineering2007,84,:1
9Status and prospects of UV-Nanoimprint technology显示文摘BENDER M FUCHS A PLACHETKA U 2006Microelectronie Engineering2006,83,:1
10Waferscale patterning by soft UV-nanoimprint lithography显示文摘PLACHETKA U BENDER M FUCHS A 2004Mi-croelectronic Engineering2004,73,2:1
11Statusand prospects of UV-nanoimprint technology显示文摘BENDER M FUCHS A PLACHETKA U 2006Microelec-tronic Engineering2006,83,456789:1
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