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309篇 您的检索式：期刊名="Microelectronic Eng"

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	题名	作者	年代	出处	被引量
1	Response of carbon nanotube transistors to electron beam exposure显示文摘	RIUS G MARTIN I GODIGNON P	2007	Microelectron Eng2007，84，58：	1
2	Effect of organic additives on structure, resistivity, and room-temperature recrystaUization of electrodeposited copper 显示文摘	Vas ko V A Tabakovic I Riemer S C	2004	Microelectron Eng2004，75，：	1
3	显示文摘	Ansbak T Petersen D H Hansen O	2009	Microelectron Eng2009，86，：	1
4	Dry etching and induced dam- age 显示文摘	VANDER DE CHEUNG R	1996	Microelectron Eng1996，32，14：	1
5	A disposable biosensor with Prussian blue deposited electrode显示文摘	Yi I-J Kim J-H Choi Y J	2006	Microelectron Eng2006，83，49：	1
6	Reactive sputter deposition and properties of TaxN thin films 显示文摘	Riekkinen T Molarius J Laurila T	2002	Microelectron Eng2002，64，14：	1
7	Degradation and surfaetant-aided regeneration of fluorinated anti-sticking mold treatments in UV nanoimprint lithography显示文摘	ZELSMANN M ALLEAUME C TRUFFIERBOUTRY D	2010	Microelectronic Eng2010，87，58：	1
8	Novel high uniformity highly reproduci- ble non-selective wet digital gate recess etch process for InP HEMTs 显示文摘	CAO X THAYNE	2003	Microelectronic Eng2003，67，：	1
9	Hole trapping at hydrogenic defects in amorphous silicon dioxide 显示文摘	E1-SAYEDA AL-M WATKINSA M B GRASSERB T	2015	Microelectron Eng2015，73，4：	1
10	Chemical mechanical polishing of Nickel for application in MEMS devices 显示文摘	T Du A vijayakumar K B Sundaram	2004	Microelectron Eng2004，75，2：	1
11	Microstructure and characteristics of the HfO2 dielectric layers grown by metalorganic molecular beam epitaxy显示文摘	HONG J H MOON T H MYOUNG J M	2004	Microelectron Eng2004，75，：	1
12	A selective CMP process for stacked low-k CVD oxide films 显示文摘	HARTMANNSGRUBER E ZWICKER G BEEKMANN K	2000	Microelectron Eng2000，50，9：	1
13	Effect of tungsten chemical vapor deposition nucleation step on via performance显示文摘	Ulmer L Georges L Veler J C	1997	Microelectron Eng1997，33，1234：	1
14	TaNx thin films as copper barriers sputter-deposited at various NH3-to-Ar flow ratios 显示文摘	Chen J K Chan C H Kuo S W	2009	Microelectron Eng2009，86，3：	1
15	V2O4- PEPC composite based pressure sensor 显示文摘	Karimov K S Abid M Mahroof-Tahir M	2011	Microelectron Eng2011，88，6：	1
16	Hall effect and dielectric properties of Mn-doped barium titanate 显示文摘	Wang X Gu M Yang B	2003	Microelectron Eng2003，66，14：	1
17	显示文摘	Zhao Y L Li W Z	2010	Microelectron Eng2010，87，：	1
18	Tantalum carbide and nitride diffu sion barriers for Cu metallization显示文摘	Laurila T Zeng K	2002	Microelectronic Eng2002，60，12：	1
19	Design of microfluidic devices for drug screening on in-vitro cells for osteoporosis therapies显示文摘	NASON F MORGANTI E COLLINI C	2011	Microelectron Eng2011，88，8：	1
20	Design of experimental optimization for ULSI CMP process applications显示文摘	PARK S W KIM C B KIM S Y	2003	Microelectron Eng2003，66，1234：	1

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