| 1 | Principle and Process Window of Cerium Dioxide Thin Film Fabrication with Dual Plasma Deposition显示文摘Cerium dioxide, CeO2, is a potentially superior material in a myriad of areas, and many methods have been proposed to deposit single crystal CeO2 thin films. A novel fabrication technique utilizing dual plasma generated by metal vacuum arc (MEVVA) and radio frequency (RF) is discussed in this paper. We have recently conducted a systematic investigation to determine the optimal process window to deposit CeO2 thin films’on Si(100) substrates. The X-ray diffraction results show the existence of CeO2(100) in the as-deposited sample. | L.P. Wang B. Y Tang X.B. Tian YX.Leng Q. YZhang and P.K.Chu Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong, China | 2001 | Journal of Materials Science & Technology2001，17，1： | 1 |
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