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8篇 您的检索式:作者名="Hoofman"
    题名 作者 年代 出处 被引量
1Impact of different slurry and polishing pad choices on the planarization efficiency of a copper CMP process显示文摘Viet H. Nguyen Roel Daamen Romano Hoofman 2004Microelectronic Engineering2004,,1:1
2Impact of different slurry and polishing pad choices on the planarization efficiency of a copper CMP process 显示文摘NGUYEN V H DAAMEN R HOOFMAN R 2004Microelectronic Engineering2004,76,1234:1
3Physiological basis of clinically used coronary hemodynamic indices 显示文摘SPAAN JAE PIEK JJ HOOFMAN JIE et ol 2006Circu- lation2006,113,3:1
4Impact of different slurry and polishing pad choices on the pla- narization efficiency of a copper CMP process 显示文摘Viet H Nguyen Roel Daamen Romano Hoofman 2004Micro- electronic Engineering2004,76,:1
5Impact of different slurry and polishing pad choices on the pIanarization efficiency of a copper CMP process显示文摘NGUYEN V H DAAMEN R HOOFMAN R 2004Microelectronic Engineering2004,76,:1
6Impact ofdifferent slurry and polishing pad choices on theplanarization efficiency of a copper CMP process显示文摘NGUYEN V H DAAMEN R HOOFMAN R 2004Microelectronic Engineering2004,76,1234:1
7Impact of dif- ferent slurry and polishing pad choices on the planarization effi ciency of a copper CMP process 显示文摘NGUYEN V H DAAMEN R HOOFMAN R 2004Microelectronic Enginee ring2004,76,1234:1
8Impact of different slurry and polishing pad choices on the planarization efficiency of a copper CMP process显示文摘Viet H. Nguyen Roel Daamen Romano Hoofman 2004Microelectronic Engineering2004,,1:1
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