维普中文期刊产品整合服务
45篇 您的检索式:作者名="FALSTER R"
    题名 作者 年代 出处 被引量
1Nucleation of oxide precipitates in vacancy-containing silicon, 显示文摘VORONKOV V V FALSTER R 2002J Appl Phys2002,91,9:1
2Effect of vacancies on nucleation of oxide precipitates in silicon 显示文摘VORONKOV V V FALSTER R 2002Mater Sci Semicond Processing2002,5,45:1
3On the properties of the intrinsic point defects in silicon A perspective from crystal growth and wafer processing 显示文摘FALSTER R VORONKOV V V QUAST F 2000Phys Stat Sol B2000,222,1:1
4The engineering of intrinsic point defects in silicon wafer and crystals 显示文摘FALSTER R VORONKOV V V 2000Mater Sci and Engineer2000,,:1
5Small-seeded species produce more seeds per square metre of canopy peryear, but not per individual per life time 显示文摘Moles A T Falster D S Leishman M R etal 2004Journal of Eeol ogy2004,92,3:1
6Grown-in microdefects, residual vacancies and oxygen precipitation bands in Czochralski silicon 显示文摘Voronkov V V Falster R 1999Crystal Growth1999,204,:1
7Vacancy-type Microdefect Formation in Czochralski Silicon显示文摘Voronkov V V Falster R 1998Journal of Crystal Growth1998,194,1:1
8Grown in microdefect, residual vacies and oxygen precipitation bands in Czochralski silicon 显示文摘Voronkov V V Falster R 1999Crystal Growth1999,204,:1
9Quantification of Defect Dynamics in Unsteady-State and Steady-State Czochralski Growth of Monocrystalline Silicon 显示文摘Kulkarni M S Vomnkov V V Falster R 2004Journal of The Electrochemical Society2004,151,10:1
10Light-induced boron-oxygen recombina- tion centres in silicon: Understanding their formation and elimination 显示文摘Voronkov V V Falster R 2014Solid State Phenomena2014,205,:1
11Lifetime recovery in p-type Czochralski silicon due to the reconfiguration of boron-oxygen complexes via a hole-emitting process显示文摘Lim B Voronkov V V Falster R 2011Appl Phys Lett2011,98,16:1
12Nitrogen interaction with vacancies in silicon 显示文摘Voronkov V V Falster R 2004Materials Science and Engineering2004,114,:1
13The effect of nitrogen on void formation in Czochralski silicon crystals 显示文摘Voronkov V V Falster R 2005Crystal Growth2005,273,:1
14The engineering of intrinsic point defects in silicon wafers and crystals显示文摘Falster R Voronkov V V 2000Material Science and Engineering2000,73,:1
15Nitrogen interaction with vacancies in silicon 显示文摘Voronkov V V Falster R 2004Materials Science and Engineering2004,114,:1
16Light interception efficiency explained by two simple variables:A test using a diversity of small-to medium-sized woody plants显示文摘Duursma R A Falster D S Valladares F 2012New Phytologist2012,193,2:1
17Vacancy and Self-interstitial Concentration Incorporated into Growing Silicon Crystals显示文摘Voronkov V V Falster R 1999Journal of Applied Physics1999,86,11:1
18Grown in microdefect, residual vacancies and oxygen precipitation bands in czochralski silicon 显示文摘VORONKOV V V FALSTER R 1999Crystal Growth1999,204,4:1
19Vacancy-type microdefect formation in czochralski silicon 显示文摘VORONKOV V V FALSTER R 1998Crystal Growth1998,194,1:1
20Latent complexes of interstitial boron and oxygen dimers as a reason for degradation of silicon-based solar cells 显示文摘Voronkov V V Falster R 2010J Appl Phys2010,107,05:1
返回顶部 每页显示:
共3页 首页 上一页 第1页 下一页 末页 /3 跳转

网站首页 | 关于我们 | 联系我们 | 产品服务 | 客服中心 | 广告服务 | 版权声明 | 网站联盟 | 友情链接 | 售卡网点

版权所有© 渝B2-20050021-1 渝公网安备 50019002500403号 违法和不良信息举报中心

互联网出版许可证 新出网证(渝)字10号 全国400电话 - 免长途话费