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14篇 您的检索式：作者名="Creatore M"

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		题名	作者	年代	出处	被引量
	1	High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin siIica-like film显示文摘	Starostin S A Premkumar P A Creatore M		0，，06：	1
	2	Role of a-Si : H bulk in surface passivation of c-Si wafers 显示文摘	ILLIBERI A SHARMA K CREATORE M	2010	Physica Status Solidi-Rapid Research Letters2010，4，7：	1
	3	Assessment ofthe potential for international dissemination of Ebola virus viacommercial air travel during the 2014 west African outbreak显示文摘	Bogoch I I Creatore M I Cetron M S	2015	Lancet2015，385，9962：	1
	4	Plas-ma-assisted atomic layer deposition of Al 2 O 3 moisture per-meation barriers on polymers显示文摘	LANGEREIS E CREATORE M HEIL S B S	2006	Appl Phy Lett2006，89，8：	1
	5	Assessment of the potential for international dissemination of Ebola virus via commercial air travel during the 2014 west African outbreak 显示文摘	Bogoch I I Creatore M I Cetron M S	2015	Lancet2015，385，9962：	1
	6	RF plasma dep- osition of SiO2 like- films: plasma phase diagnostics and gas barrier film properties optimisation 显示文摘	Creatore M Palumbo F Agostion R	2001	Surf Coat Technol2001，，：	1
	7	Patterns of tuberculosis risk over time among recent immigrants to Ontario, Canada 显示文摘	Creatore MI Lain M Wobeser WL	2005	Int J Tuberc Lung Dis2005，9，6：	1
	8	Assessment ofthe potential for international dissemination of Ebola virus viacommercial air travel during the 2014 west African outbreak显示文摘	Bogoch I I Creatore M I Cetron M S	2015	Lancet2015，385，9962：	1
	9	Assessment ofthe potential for international dissemination of Ebola virus viacommercial air travel during the 2014 west African outbreak显示文摘	Bogoch I I Creatore M I Cetron M S	2014	Lancet2014，385，9962：	1
	10	In situ spectroscopic ellipsometry growth studies on the Al-doped ZnO films deposited by remote plasma-enhanced metalorganic chemical vapor deposition 显示文摘	VOLINTIRU I CREATORE M SANDEN M C M	2008	J Appl Phys2008，103，03：	1
	11	Nitrogen incorporation during metal organic chemical vapor deposition of ZnO films using a remote Ar/N2 plasma显示文摘	Volintiru I Creatore M Vanhelvoort W H	2006	Appl Phys Lett2006，89，02：	1
	12	Plasma-assisted a- tomic layer deposition of Al2O3 moisture permeation barriers on polymers显示文摘	Langereis E Creatore M Heil S B S	2006	Applied Physics Letters2006，89，08：	1
	13	A hard graphitelike hydrogenated amorphous carbon grown at high deposition rate (>15 nm/s)显示文摘	Singh S V Creatore M Groenen R	2008	Appl Phys Lett2008，92，22：	1
	14	Novel approach to thin film polycrystalline silicon on glass 显示文摘	ILLIBERI A SHARMA K CREATORE M	2009	Materials Letters2009，63，：	1

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