| 1 | Electrodeposited Ni,Fe,Co and Cu single and multilayer nanowire arrays on anodic aluminum oxide template显示文摘The Ni, Fe, Co and Cu single and multilayer nanowire arrays to make perpendicular magnetic recording media were fabricated with nanoporous anodic aluminum oxide (AAO) templates from Watt solution and additives by the DC electrodeposition. The results show that the diameters of Ni, Fe, Co and Cu single and multilayer nanowires in AAO templates are 40-80 nm and the lengths are about 30 μm with the aspect ratio of 350-750. The magnetic properties of the prepared nanowires are different under different electrodepositing conditions. The remanences (Br) of Ni/Cu/Fe multilayer nanowires are lower than those of others multilayer nanowires, and coercivity (Hc) of Ni/Cu/Fe multilayer nanowires are lower than those of others multilayer nanowires. These are compatible with the required conditions of high density magnetic media devices that should have the low coercivity to easily success magnetization and high remanence to keep magnetization after removal of magnetic field. | Bobomurod HAMRAKULOV In-Soo KIM M.G.LEE B.H.PARK | 2009 | 中国有色金属学会会刊:英文版2009，19，B09： | 1 |
| 2 | Experimental Status of the HANBIT Facility显示文摘HANBIT is a magnetic mirror confinement device. Recent physics experiments have been mainly focused on identifying discharge characteristics and on getting stable plasma production and operation modes, by using a 500 kW slot antenna system at a fixed RF frequency of 3.5 MHz and varying discharge conditions such as fueling rate, RF power, and B-field intensity in central cell. Two distinct operation modes are found to be very sensitive to the RF power as well as the ratio of the RF frequency to the ion cyclotron frequency. A MHD interchange mode of m- -1 is clearly observed and the stabilizing mechanism can be explained by the sideband coupling theory. | S.J.Yoo M.Kwon J.G.Bak K.Choh I.S.Choi J.H.Choi J.W.Choi A.C.England J.Hong H.S.Jeon H.G.Jhang J.S.Ju M.Jung J.Y.Kim S.S.Kim W.H.Ko K.Y.Kwak M.C.Kyum B.J.Lee D.K.Lee J.H.Lee H.G.Lee S.G.Lee T.Lho H.K.Na B.H.Park M.K.Park D.C.Seo S.H.Seo J.H.Yeom J.S.Yoon K.I.You | 2004 | Plasma Science and Technology2004，6，4： | 1 |
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