共被期刊论文引用了3次
您的检索式：您选中1篇文献正在查看引证文献汇总
|
|
|
题名
|
作者
|
年代
|
出处
|
被引量
|
| 1 | Research progress in anisotropic magnetoresistance显示文摘Anisotropic magnetoresistance (AMR) is an important physical phenomenon that has broad application potential in many relevant fields. Thus, AMR is one of the most attractive research directions in material science to date. In this article, we summarize the recent advances in AMR, including traditional permalloy AMR, tunnel AMR, ballistic AMR, Coulomb blockade AMR, anomalous AMR, and antiferromagnetic AMR. The existing problems and possible challenges in developing more advanced AMR were briefly discussed, and future development trends and prospects were also speculated. | Chong-Jun Zhao Lei Ding Jia-Shun HuangFu Jing-Yan Zhang Guang-Hua Yu | 2013 | Rare Metals2013，32，3： | 5 |
| 2 | 基片温度对Ni_(81)Fe_(19)薄膜磁性能的影响显示文摘采用电子束蒸发法在Si(111)基片上制备厚度约为100nm的Ni81Fe19薄膜,研究了基片温度对薄膜微观结构及磁性能的影响。结果表明,随着基片温度的升高,Ni81Fe19薄膜(111)衍射峰逐渐锐化,衍射峰强度显著增强,薄膜晶粒逐渐长大;薄膜的饱和磁化强度(Ms)及面内矫顽力(Hc)随基片温度的升高均逐渐增大;随着基片温度的升高,薄膜在9GHz下的共振场(Hr)呈单调降低的趋势,而铁磁共振线宽(ΔH)则先减小后增大最后基本保持不变。当基片温度为100℃时,薄膜铁磁共振线宽具有最小值ΔH=7.44kA/m(9GHz)。 | 张霞 兰中文 孙科 余忠 许志勇 朱光伟 | 2013 | 磁性材料及器件2013，44，4： | 0 |
| 3 | Structural and physical properties of permalloy thin films prepared by DC magnetron sputtering at different substrate temperature显示文摘Permalloy Ni8oFe20 films have been grown on thermal oxidized Si (111) wafers by magnetron sputtering at wellcontrolled substrate temperatures of 300, 500, 640 and 780 K in 0.65 Pa argon pressure. The base pressure was about l×l0-4 Pa. The deposition rate was about 5 nm/min for all the films. The structure of the films was studied using X-ray diffraction, scanning electron microscopy and atomic force microscopy. The composition of the films was analyzed using scanning Auger microprobe. The resistance and magnetoresistance of the films were measured using four-point probe technique. The results show that the content of oxygen in the films decreases gradually with raising substrate temperature. In addition, the surface morphology of the films presents notable change with the increasing of the substrate temperature; the residual gases and defects decrease and the grains have coalesced evidently, and then the grains have grown up obviously and the texture of (111) orientation develops gradually in the growing film.As a result, the resistivity reduces apparently and magnetoresistance ratio increases markedly with raising substrate temperature. | FengpingWang PingWu HongQiu LiqingPan HuanpingLiu YueTian ShengLuo | 2004 | Journal of University of Science and Technology Beijing2004，11，1： | 0 |
您所在的机构暂未开通此部分的功能，请联系管理员