| 1 | Geometric and physical configurations of meta-atoms for advanced metasurface holography显示文摘Metasurfaces consisting of subwavelength structures,so-called meta-atoms,have steadily attracted considerable attention for advanced holography due to their advantages in terms of high-resolution holographic images,large field of view,and compact device volume.In contrast to conventional holographic displays using bulky conventional diffractive optical elements,metasurface holography enables arbitrary complex wavefront shaping with a much smaller footprint.In this review,we classify metasurface holography according to the meta-atom design methodologies,which can further expand hologram functionalities.We describe light-matter interactions,particularly in metasurface systems,using the relevant the Jones matrix to rigorously explain modulations of the amplitude,phase,and polarization of light.Six different types of metaatoms are presented,and the corresponding achievable wavefronts that form the holographic images in the far-field are also provided.Such a simple classification will give a straightforward approach to design and further realize advanced metasurface holographic devices. | Joohoon Kim Younghwan Yang Trevon Badloe Inki Kim Gwanho Yoon Junsuk Rho | 2021 | InfoMat2021，3，7： | 4 |
| 2 | High Refractive Index Ti3O5 Films for Dielectric Metasurfaces显示文摘Ti_3 O_5 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces.The film of subwavelength(632 nm) thickness is deposited on a silicon substrate and annealed at 400°C. The ellipsometr.y result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%,whieh is in good agreement with metasurfaces. | Sohail Abdul Jalil Mahreen Akram Gwanho Yoon Ayesha Khalid Dasol Lee Niloufar Raeis-Hosseini Sunae So Inki Kim Qazi Salman Ahmed Junsuk Rho Muhammad Qasim Mehmoo | 2017 | Chinese Physics Letters2017，34，8： | 2 |
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