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16篇 您的检索式:作者名="Windischmann H"
    题名 作者 年代 出处 被引量
1Intrinsic stress in sputtered thin film 显示文摘Windischmann H 1991J Vac Sci Technol1991,9,4:1
2Intrinsic stress in diamond films prepared by microwave plasma CVD显示文摘Windischmann H Epps G F Cong Y 1991J Appl Phys1991,69,4:1
3The development of high- performance CVD diamond coated tool inserts显示文摘OLSEN J M WINDISCHMANN H 1998Diamond Films Technology1998,,8:1
4显示文摘 Windischmann H 1999Diamond and Related Materials1999,8,:1
5Intrinsic stress scaling for polycrystalline thin films prepered by ion beam sputtering 显示文摘WINDISCHMANN H 1987J A P1987,62,5:1
6Cluster size and temperature measurement in a pure vapor source expansion显示文摘PRUETT J G WINDISCHMANN H NICHOLAS M L 1988J Appl Phys1988,64,:1
7Cluster size and temperature measurement in a pure vapor source expansion显示文摘Pruett J G Windischmann H Nicholas M L 1988J Appl Phys1988,64,5:1
8Stress measurement of CVD diamond films显示文摘Windischmann H Gray K J 1995Diamond and Related Materials1995,,4:1
9Stress measurement of CVD diamond films 显示文摘Windischmann H Gray K J 1995Diamond and Related Materials1995,4,:1
10Developments in CVD-diamond synthesis during the past decade显示文摘Butler J E Windischmann H 1998MRS Bulletin1998,,9:1
11Intrinsic Stress in Diamond Films Prepared by Microwave Plasma CVD显示文摘 Glenn F Epps Yue Cong Collins R W 1991Jouranl of Applied Physics1991,69,4:1
12Stress Measurement of CVD Diamond Films显示文摘Windischmann H Gray K J 1995Diamond and Related Materials1995,,4:1
13Development in CVD- Diamond Synthesis During the Past Decade 显示文摘Butler J E Windischmann H 1998MRS Bulletin1998,23,9:1
14Free-standing CVD diamond wafers for thermal management by dc arc jet technology显示文摘Gray K J Windischmann H 1999Diamond and Related Materials1999,8,25:1
15Intrinsic stress in diamond films prepared by microwave plasma CVD显示文摘Windischmann H Glenn F Epps Yue Cong 1991Journal of Applied Physics1991,,4:1
16Intrinsic Stress in Sputtered Thin Films显示文摘Windischmann H 1991J Vac Sci TechnolA1991,9,4:1
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