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2篇 您的检索式:作者名="Stephan Schroder"
    题名 作者 年代 出处 被引量
1Particle-Image Velocimetry and Force Measurements of Leading-Edge Serrations on Owl-Based Wing Models显示文摘Andrea Winzen Benedikt Roidl Stephan Klan Michael Klaas Wolfgang Schroder 2014Journal of Bionic Engineering2014,11,3:8
2Manufacture and characterization of graphene membranes with suspended silicon proof masses for MEMS and NEMS applications显示文摘Graphene’s unparalleled strength,chemical stability,ultimate surface-to-volume ratio and excellent electronic properties make it an ideal candidate as a material for membranes in micro-and nanoelectromechanical systems(MEMS and NEMS).However,the integration of graphene into MEMS or NEMS devices and suspended structures such as proof masses on graphene membranes raises several technological challenges,including collapse and rupture of the graphene.We have developed a robust route for realizing membranes made of double-layer CVD graphene and suspending large silicon proof masses on membranes with high yields.We have demonstrated the manufacture of square graphene membranes with side lengths from 7µm to 110µm,and suspended proof masses consisting of solid silicon cubes that are from 5µm×5µm×16.4µm to 100µm×100µm×16.4µm in size.Our approach is compatible with wafer-scale MEMS and semiconductor manufacturing technologies,and the manufacturing yields of the graphene membranes with suspended proof masses were>90%,with>70%of the graphene membranes having>90%graphene area without visible defects.The measured resonance frequencies of the realized structures ranged from tens to hundreds of kHz,with quality factors ranging from 63 to 148.The graphene membranes with suspended proof masses were extremely robust,and were able to withstand indentation forces from an atomic force microscope(AFM)tip of up to~7000nN.The proposed approach for the reliable and large-scale manufacture of graphene membranes with suspended proof masses will enable the development and study of innovative NEMS devices with new functionalities and improved performances.Xuge Fan Anderson D.Smith Fredrik Forsberg Stefan Wagner Stephan Schroder Sayedeh Shirin Afyouni Akbari Andreas C.Fischer Luis Guillermo Villanueva Mikael Ostling Max C.Lemme Frank Niklaus 2020Microsystems & Nanoengineering2020,6,1:4
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