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2篇 您的检索式:作者名="S.M.DANIELS"
    题名 作者 年代 出处 被引量
1Electron Density and Optical Emission Measurements of SF_6/O_2 Plasmas for Silicon Etch Processes显示文摘This work investigates internal plasma process parameters using a hairpin resonance probe and optical emission spectroscopy. The dependence of electron density and atomic fluorine on the percentage of oxygen in an SF6 /O2 discharge was measured using these methods. An RIE Oxford Instruments 80 plus chamber was used for the experiments. Two different process powers (100 W and 300 W) at a constant pressure (100 mTorr) were used, and it was found that the optical emission intensity of the 703.7 nm and 685.6 nm lines of atomic fluorine increased rapidly as oxygen was added to the SF6 discharge, reached their maximum at an O2 fraction of 20% and then decreased with further addition of oxygen. The plasma electron density was also strongly influenced by the addition of O2 .M.M.MORSHED S.M.DANIELS 2012Plasma Science and Technology2012,14,4:1
2Plasma Treatment of Natural Jute Fibre by RIE 80 plus Plasma Tool显示文摘Plasma treatment can be used to modify the structure of natural fibre like jute fora variety of applications. Environmentally friendly jute fibre was treated with argon and oxygenplasma. The treated samples were characterized by X-ray diffraction (XRD), Fourier transforminfrared spectroscopy (FTIR) and optical microscope. The macromolecular and microstructuralchanges in cellulose confirmed the change by plasma treatment. The XRD results confirmed thatthe crystal size and the crystallinity of the plasma treated fibre increased. Argon plasma treatedfibre had a smooth and compact surface, compared to oxygen plasma treated fibre. The maximumstain (i.e. stress) concentrated in the oxygen plasma treated fibre. Optical micrographs showedthe oxygen plasma treated fibre tended to rupture due to higher strain (i.e., stress) comparedto fibre with argon plasma treatment. FTIR results also provided the evidence of change in thechemical constituents with plasma treatment.M.M.MORSHED M.M.ALAM S.M.DANIELS 2010Plasma Science and Technology2010,12,3:1
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