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| 1 | A Heterodyne Interferometer with Separated Beam Paths for High-Precision Displacement and Angular Measurements显示文摘As standard concepts for precision positioning within a machine reach their limits with increasing measurement volumes,inverse concepts are a promising approach for addressing this problem.The inverse principle entails other limitations,as for high-precision positioning of a sensor head within a large measurement volume,three four-beam interferometers are required in order to measure all necessary translations and rotations of the sensor head and reconstruct the topography of the reference system consisting of fixed mirrors in the x-,y-,and z-directions.We present the principle of a passive heterodyne laser interferometer with consequently separated beam paths for the individual heterodyne frequencies.The beam path design is illustrated and described,as well as the design of the signal-processing and evaluation algorithm,which is implemented using a System-On-a-Chip with an integrated FPGA,CPU,and A/D converters.A streamlined bench-top optical assembly was set up and measurements were carried out to investigate the remaining non-linearities.Additionally,reference measurements with a commercial homodyne interferometer were executed. | Guido Straube Juan Sebastian Fischer Calderon Ingo Ortlepp Roland FuBl Eberhard Manske | 2021 | Nanomanufacturing and Metrology2021，4，3： | 1 |
| 2 | Tip-and Laser-based 3D Nanofabrication in Extended Macroscopic Working Areas显示文摘The field of optical lithography is subject to intense research and has gained enormous improvement.However,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies.This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable:custom design and solutions for specific applications will dominate future development(Fritze in:Panning EM,Liddle JA(eds)Novel patterning technologies.International society for optics and photonics.SPIE,Bellingham,2021.http://gffzzd3cc09b8251d45dfsupf5o0wobfox6o6k.ffgz.tsg.suse.edu.cn/10.1117/12.2593229).For this reason,new aspects arise for future lithography,which is why enormous effort has been directed to the development of alternative fabrication technologies.Yet,the technologies emerging from this process,which are promising for coping with the current resolution and accuracy challenges,are only demonstrated as a proof-of-concept on a lab scale of several square micrometers.Such scale is not adequate for the requirements of modern lithography;therefore,there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies.Similar challenges arise because of the technical progress in various other fields,realizing new and unique functionalities based on nanoscale effects,e.g.,in nanophotonics,quantum computing,energy harvesting,and life sciences.Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks,which are available at the Technische Universitiit Ilmenau in the form of nanopositioning and nanomeasuring(NPM)machines.With this equipment,the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters. | Ingo Ortlepp Thomas Frohlich Roland FuBl Johann Reger Christoph Schaffel Stefan Sinzinger Steffen Strehle ReneTheska Lena Zentner Jens-Peter Zollner Ivo WRangelow Carsten Reinhardt Tino Hausotte Xinrui Cao Oliver Dannberg Florian Fern David Fischer Stephan Gorges Martin Hofmann Johannes Kirchner Andreas Meister Taras Sasiuk Ralf Schienbein Shraddha Supreeti Laura Mohr-Weidenfeller Christoph Weise Christoph Reuter Jaqueline Stauffenberg Eberhard Manske | 2021 | Nanomanufacturing and Metrology2021，4，3： | 0 |
| 3 | Fundamental Investigations in the Design of Five-Axis Nanopositioning Machines for Measurement and Fabrication Purposes显示文摘The majority of nanopositioning and nanomeasuring machines(NPMMs)are based on three independent linear movements in a Cartesian coordinate system.This in combination with the specific nature of sensors and tools limits the addressable part geometries.An enhancement of an NPMM is introduced by the implementation of rotational movements while keeping the precision in the nanometer range.For this purpose,a parameter-based dynamic evaluation system with quantifiable technological parameters has been set up and employed to identify and assess general solution concepts and adequate substructures.Evaluations taken show high potential for three linear movements of the object in combination with two angular movements of the tool.The influence of the additional rotation systems on the existing structure of NPMMs has been investigated further on.Test series on the repeatability of an NPMM enhanced by a chosen combination of a rotary stage and a goniometer setup are realized.As a result of these test series,the necessity of in situ position determination of the tool became very clear.The tool position is measured in situ in relation to a hemispherical reference mirror by three Fabry-Perot interferometers.FEA optimization has been used to enhance the overall system structure with regard to reproducibility and long-term stability.Results have been experimentally investigated by use of a retroreflector as a tool and the various laser interferometers of the NPMM.The knowledge gained has been formed into general rules for the verification and optimization of design solutions for multiaxial nanopositioning machines. | Ralf Schienbein Florian Fern Rene Theska Shraddha Supreeti Roland FuBl Eberhard Manske | 2021 | Nanomanufacturing and Metrology2021，4，3： | 0 |
| 4 | Experimental Setup for the Investigation of Reproducibility of Novel Tool Changing Systems in Nanofabrication Machines显示文摘Nanomeasuring machines developed at the Technische Universitat Ilmenau enable three-dimensional measurements and manufacturing processes with the lowest uncertainties.Due to the requirements for these processes,a highly reproducible and long-term stable tool changing system is needed.For this purpose,kinematically determined couplings are widely used.The state-of-the-art investigations on those are not sufficient for the highest demands on the reproducibility required for this application.A theoretical determination of the reproducibility based on analytical or numerical methods is possible,however not in the desired nanometer range.Due to this,a measurement setup for the determination of the reproducibility in five degrees of freedom with nanometer uncertainty was developed.First,potential measuring devices are systematically examined and measurement principles were developed out of this.A three-dimensional vector-based uncertainty analysis is performed to prove the feasibility of the measurement principle and provides a basis for further design.As a result,a transla-tory measurement uncertainty of 10 nm and a rotatory uncertainty of 11 nrad can be reached.Afterwards,the measurement setup is designed,focusing on the metrological frame and the lift-off device.The developed setup exceeds the uncertainties of the measurement setups presented in the state-of-the-art by an order of magnitude,allowing new in-depth investigations of the reproducibility of kinematic couplings. | Florian Weigert Roman Hebenstreit Roland FuBl Rene Theska | 2021 | Nanomanufacturing and Metrology2021，4，3： | 0 |
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