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		题名	作者	年代	出处	被引量
	1	ICRF Experiments and Potential Formation on the GAMMA 10 Tandem Mirror显示文摘Target plasmas,on which the formation of the electrostatic potentials and the im-provement of the confinement are studied,are produced with ICRF in the GAMMA 10 tandemmirror.The ion temperature of more than 10 keV has been achieved in relatively low densityplasmas.When the strong ICRF heating is applied,it is observed that the high frequency andthe low frequency fluctuations are excited and suppress the increase of the plasma parameters.Recently,a new high power gyrotron system has been constructed and the ECRH power in plugextends up to 370 kW.The improvement of the confinement due to the formation of the potentialin the axial direction and the strong radial electric field shear has been observed.	M.ICHIMURA T.CHO H.HIGAKI M.HIRATA H.HOJO T.IMAI K.ISHII M.K.ISLAM A.ITAKURA I.KATANUMA J.KOHAGURA Y.NAKASHIMA T.NUMAKURA T.SAITO Y.TATEMATSU M.WATANABE M.YOSHIKAWA	2006	Plasma Science and Technology2006，8，1：	0
	2	Progress in Physics and Technology Developments for the Modification of JT-60显示文摘Recent progress in the physics and engineering design study for the modification programme of JT-60 is presented.In order to achieve a steady state high-β plasma operation,which is the dominant issue of this programme,physics design for the MHD control and the stability analysis is investigated.Engineering design and the R & D for the superconducting coils,irradiation shield are performed well towards the mission of programme.	H.Tamai M.Matsukawa G.Kurita N.Hayashi K.Urata Y.M.Miura K.Kizu K.Tsuchiya A.Morioka Y.Kudo S.Sakurai K.Masaki T.Suzuki M.Takechi Y.Kamada A.Sakasai S.Ishida K.Abe A.Ando T.Cho T.Fujii T.Fujita S.Goto K.Hananda A.Hatayama T.Hino H.Horiike N.Hosogane M.Ichimura Tsuji-Iio S.Itoh M.Katsurai M.Kikuchi A.Kohyama H.Kubo M.Kuriyama M.Matsuoka Y.Miura N.Miya T.Mizuuchi K.Nagasaki H.Ninomiya N.Nishino Y.Ogawa K.Okano T.Ozeki M.Saigusa M.Sakamoto M.Satoh M.Shimada R.Shimada M.Shimizu T.Takagi Y.Takase T.Tanabe K.Toi Y.Ueda Y.Uesugi K.Ushigusa Y.Yagi T.Yamamoto K.Yatsu K.Yoshikawa	2004	Plasma Science and Technology2004，6，1：	0

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