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		题名	作者	年代	出处	被引量
	1	Dependence of Magnetic Properties and Microstructure of Ni_(81)Fe_(19) Film on Base Vacuum and Sputtering Pressure显示文摘The Ni81Fe19/ Ta films with different NiFe thickness were prepared at different base vacuums and sputtering pressures. The re- sults of magnetic measurement and atomic force microscope (AFM) showed that the films prepared at higher base vacuum and lower sputtering pressure had larger ARIR. The reason should be that higher base vacuum and lower sputtering pressure introduce larger grain- size and lower surface roughness, which will weaken the scattering of electrons, reduce the resistance R, and increase △R/R.	HongchenZhao HongSi 等	2002	Journal of University of Science and Technology Beijing2002，9，1：	1
	2	Interface Reaction of Ta/NiFe and NiFe/Ta and the Dead Layer显示文摘The structures of Ta/Ni81Fe19 and Ni8l Fel9/Ta are commonly used in magnetoresistance multilayers. It is found that the thickness of dead layer in Ta/Ni81Fe19/Ta was about 1.6±0.2 nm. X-ray photoelectron spectroscopy (XPS) was used to study the interfaces of Ta/Ni81Fe19 and Ni81Fe19/Ta. The results show that there is a reaction at the two interfaces: 2Ta+Ni=NiTa2, which caused the thinning of the effective NiFe layer. Furthermore, this reaction could also explain the phenomenon that the dead layer thickness of spin valves multilayers prepared by MBE is thinner than those prepared by magnetron sputtering.	HongchenZHAO GuanghuaYU HongSI	2004	Journal of Materials Science & Technology2004，20，2：	0

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