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18篇 您的检索式：作者名="Helmersson M"

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		题名	作者	年代	出处	被引量
	1	Influence of high power densities on the composition of pulsed magnetron plasmas显示文摘	A.P. Ehiasarian R. New W.-D. Münz L. Hultman U. Helmersson V. Kouznetsov	2002	Vacuum2002，，2：	2
	2	Comparative study of subgingival microbiological sampling techniques 显示文摘	Renvert S Wikstr?m M Helmersson M	1992	J Periodontol1992，63，10：	1
	3	Ionized physical vapor deposition (IPVD): A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
	4	Both cyclooxygenase- and eytokine- mediated inflammation are associated with carotid intimamedia thickness显示文摘	Wohlin M Helmersson J Sundstrom J	2007	Cytokine2007，38，3：	1
	5	Ion- ized physical vapor deposition ( IPVD ) : A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
	6	Phase control of Al2O3 thin films grown at low temperatures 显示文摘	Andersson J M Wallin E Helmersson U	2006	Thin Solid Films2006，513，：	1
	7	Fully dense, non-faceted 1 ll-textured high power impulse magnetron sputteringTiN films grown in the absence of substrate heating and bias 显示文摘	LATTEMANN M HELMERSSON U GREENE J E	2010	Thin Solid Films2010，518，：	1
	8	A novel pulsed magnetron sputter technique utilizing very high target power densities 显示文摘	KOUZNETSOV V MACfi K K SCHNEIDER J M HELMERSSON U PETROV I	1999	Surface and Coatings Technology1999，122，：	1
	9	Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel 显示文摘	LATTEMANN M EHIASARIAN A P BOHLMARK J PERSSON P A O HELMERSSON U	2006	Surface and Coatings Technology2006，200，：	1
	10	Effect of Peak Power in Reactive High Power Impulse Magnetron Sputtering of Titanium Dixoide显示文摘	AIEMPANAKIT M HELMERSSON U AIJAZ A	2011	Surface and Coatings Technology2011，205，：	1
	11	Non-faceted 111textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias显示文摘	Lattemann M Helmersson U	2010	Thin Solid Films2010，518，21：	1
	12	Ionized physical vapor deposition (IPVD): A review of technology and applica- tions 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
	13	Ionized Physical Vapor Deposition (IPVD): A Review of Technology and Applications显示文摘	HELMERSSON U LATTEMANN M BOHLMARK J	2006	Thin Solid Films2006，513，1：	1
	14	Ionized physical vapor deposition (IPVD): A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
	15	Ionized phy-sical vapor deposition (IPVD ) : A review of technology andapplications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
	16	Ionized Physi- cal Vapor Deposition (IPVD) : a Review of Technology and Applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
	17	Phase control of Al2O3 thin films grown at low temperatures 显示文摘	ANDERSSON J M WALLIN E HELMERSSON U	2006	Thin Solid Films2006，513，：	1
	18	Epitaxial growth of W-doped VO 2 /V 2 O 3 multilayer on α-Al 2 O 3 (110) by reactive magnetron sputtering显示文摘	P Jin M Tazawa K Yoshimura K Igarashi S Tanemura K Macák U Helmersson	2000	Thin Solid Films2000，，1：	1

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