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11篇 您的检索式：作者名="Hebner G"

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		题名	作者	年代	出处	被引量
	1	Fission-Fragmeat-Excited Xenon/rare Gas Mixture显示文摘	Hebner G A Hays G N	1993	J Appl Phys1993，74，6：	1
	2	Establishment and growth of native hardwood and conifer seedlings underplanted in thinned Douglas -fir stands显示文摘	Maas - Hebner K G Emmingham W H Larson D J	2005	Forest Ecology and Management2005，208，3：	1
	3	Fluid/pore-mineral transformations during simulated steam injection: implications for reduced permeability damage 显示文摘	Hebner B A Bird G W Longstaffe F J	1986	Journal of Canadian Petroleum Technology1986，25，：	1
	4	An experimental study of a parallel-plate radio-frequency discharge: measurements of the radiation temperature and electron density显示文摘	Hebner G A Verdeyen J T Kushner M J	1988	J Appl Phys1988，63，7：	1
	5	Frequency dependent plasma characteristics in a capacitively coupled 300mm wafer plasma processing chamber显示文摘	Hebner G Barnat E Miller P	2006	Plasma Sources Sci Technol2006，15，：	1
	6	Direct simulationMonte Carlo of inductively coupled plasma and comparison with experiments 显示文摘	JOHANNES J BARTEL T HEBNER G A	1997	J Electrochem Society1997，144，7：	1
	7	查看详情显示文摘	Hebner G A		0，，：	1
	8	Ion and neutral species in C2F6 and CHF3 dielectric etch discharges 显示文摘	Jayaraman R McGrath R T Hebner G A	1999	J Vac Sci Technol A1999，17，：	1
	9	In situ measurement of the metalorganic and hydride partial pressures in a MOCVD reactor using ultraviolet absorption spectroscopy显示文摘	Hebner G A Killeen K P Biefeld R M	1989	Journal of Crystal Growth1989，98，3：	1
	10	An inductively coupled plasma source for the gaseous electronics conference RF reference cell 显示文摘	Miller P A Hebner G A	1995	Journal of Research of the National Institute of Standards and Technology1995，100，4：	1
	11	Frequency de- pendent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber显示文摘	Hebner G A Barnat E V Miller P A	2006	Plasma Sources Science and Technology2006，15，4：	1

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