| 5 | Hybrid gold/DNA nanowire circuit with sub-10nm nanostructure arrays显示文摘We report on a simple and efficient method for the selective positioning of Au/DNA hybrid nanocircuits using a sequential combination of electron-beam lithography(EBL),plasma ashing,and a molecular patterning process.The nanostructures produced by the EBL and ashing process could be uniformly formed over a 12.6 in 2 substrate with sub-10 nm patterning with good pattern fidelity.In addition,DNA molecules were immobilized on the selectively nanopatterned regions by alternating surface coating procedures of 3-(aminopropyl)triethoxysilane(APS)and diamond like carbon(DLC),followed by deposition of DNA molecules into a well-defined single DNA nanowire.These single DNA nanowires were used not only for fabricating Au/DNA hybrid nanowires by the conjugation of Au nanoparticles with DNA,but also for the formation of Au/DNA hybrid nanocircuits.These nanocircuits prepared from Au/DNA hybrid nanowires demonstrate conductivities of up to 4.3×10^(5) S/m in stable electrical performance.This selective and precise positioning method capable of controlling the size of nanostructures may find application in making sub-10 nm DNA wires and metal/DNA hybrid nanocircuits. | Jong Seob Choi Hye Bin Park Jonathan HTsui Byungyou Hong Deok-Ho Kim Hyung Jin Kim | 2020 | Microsystems & Nanoengineering2020，6，1： | 0 |
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