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20篇 您的检索式：作者名="H Oechsner"

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	题名	作者	年代	出处	被引量
1	Influence of powder formation in a silane discharge on a-Si : H film growth monitored by in situ ellipsometry显示文摘	Schmidt U I SchrOder B Oechsner H	1993	J Non- Cryst Solids1993，1，：	1
2	On the influence of substrate temperature for cubic boron nitride growth显示文摘	Le Y K Oechsner H	2003	Thin Solid Films2003，437，12：	1
3	Effect of different pH-values on process parameters in two-phase anaerobic digestion of high-solid substrates显示文摘	LINDNER J ZIELOKA S OECHSNER H	2015	Environmental Technology2015，36，2：	1
4	Compositional and structural characterization of temperature-induced solidstate reactions in Al/Ni multilayers显示文摘	ROTHHAAR U OECHSNER H SCHEIB M	2000	Physical Review:B2000，61，2：	1
5	Anaerobic digestion of lignocellulosie bio- mass : Challenges and opportunities 显示文摘	C Sawatdeenarunat K C Surendra D Takara H Oechsner $ K Khanal	2015	Bioresouree Technology2015，178，0：	1
6	Process controlled micro-structural and binding properties of hard physical vapor deposition films显示文摘	OECHSNER H	1998	J Vac Sci Technol A1998，16，3：	1
7	Deposition of Nano- crystalline Silicon Films (nc-Si :H) From a Pure ECWR- Sill4 Plasma显示文摘	Scheib M Schrder B Oechsner H	1996	Journal of Non-Crystalline Solids1996，，：	1
8	ECWR-Plasma CVD as a Novel Technique for Phase Controlled Deposition of Semiconductor Films 显示文摘	Oechsner H Scheib M Goebel H	1999	Thin Solid Films1999，341，：	1
9	Process Controlled Microstructural and Binding Properties of Hard Physical Vapor Desposition Films显示文摘	Oechsner H	1998	J Vac Sci Technol1998，16，3：	1
10	Theoretical Background and Some Applica- tions of ECWR-Plasmas 显示文摘	Oechsner H	2009	Vacuum2009，83，：	1
11	Plasma Assisted Deposi- tion of Nanocrystalline BCN Thin Films and Property Characterization 显示文摘	Cao Z X Liu L M Oechsner H	2002	J Vac Sci Technol2002，20，6：	1
12	Effect of Concurrent N2+ and N Ion Bombardment on the Plasma-Assisted Deposition of Carbon Nitride Thin Film 显示文摘	Cao Z X Oechsner H	2004	J Vac Sci Technol2004，22，2：	1
13	Process Controlled Microstructural and Binding Properties of Hard Physical Vapor Desposition Films显示文摘	Oechsner H	1998	J Vac Sci Technol1998，16，3：	1
14	Production of Mixed Metal-Gas and Pure Metal Ion Beams with an Electrodeless Rfion Source in the Low KeV Regime 显示文摘	Waldorf J Oechsner H	1992	Rev Sci Instr1992，63，：	1
15	INA-X:A Novel Instrument for E- lectron-Gas Secondary Neutral Mass Spectrometry with Optional in Situ X-Ray Photoelectron Spectroscopy显示文摘	Oechsner H Mller M	1999	J Vac Sci Technol1999，17，6：	1
16	Biogas production with horse dung in solid-phase digestion systems 显示文摘	Kusch S Oechsner H Jungbluth T	2008	Bioresource Technology2008，99，5：	1
17	Growth Conditions of the Cubic Phase in Boron Nitfide Films 显示文摘	Oechsner H	2006	Thin Solid Film2006，515，1：	1
18	ECWR-Plasma CVD as a novel technique for phase controlled deposition of semiconductor films 显示文摘	Oechsner H ScheibM Goebel H	1999	Thin Solid Films1999，341，1：	1
19	Secondary neutral mass spectrometry (SNMS) -recent methodical progress and applications to fundamental studies in particle/surface interaction 显示文摘	Oechsner H	1995	International Journal of Mass Spectrometry and Ion Processes1995，143，：	1
20	Biogas production with horse dung in solid-phase digestion systems显示文摘	Kusch S Oechsner H Jungbluth T	2008	Bioresource Technology2008，99，5：	1

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