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14篇 您的检索式：作者名="Frach P"

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		题名	作者	年代	出处	被引量
	1	Seasonal variations in levels of butyltin compounds in mussel tissues sampled in an oil port显示文摘	RIVARO P FRACHE R LEARDI R	1997	Chemospherc1997，34，1：	1
	2	Sputter deposition of silicon oxynitride gradient and multilayer coatings显示文摘	Weber J Bartzsch H Frach P	2008	Applied Optics2008，47，13：	1
	3	Advanced Key Technology for Magnetron Sputtering and PECVD of Inorganic and Hybrid Transparent Coatings显示文摘	FRACH P GLOESS D BARTZSCH H	2010	Thin Solid Films2010，518，11：	1
	4	Simultaneous determination of CFC-11, CFC-12 and CFC-113 in seawater samples using a purge and trap gas-chromatographic system显示文摘	Massolo S Rovaro P Frache R	2009	Talanta2009，80，：	1
	5	Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photo catalytic TiO2 films显示文摘	Ohno S Sato D Kon M Song P K Yoshikawa M Suzuki K Frach P Shigesato Y	2003	Thin Solid Films2003，445，2：	1
	6	Aspects and resuhs of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering 显示文摘	Frach P Heisig U Gottfried C Walde H	1993	Surf Coat Technol1993，59，：	1
	7	Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering显示文摘	Bartzach H Glob D BOcher B Frach P Gocdickc K	2003	Surface and Coatings Technology2003，，：	1
	8	A versatile coating tool for reactive in-line sputtering in different pulse modes 显示文摘	Frach P Goedicke K Gotffried C Bartzsch H	2001	Surf Coat Technol2001，，：	1
	9	Advantageous possibilities, design aspects and technical use of doublering magnetron sputter sources 显示文摘	FRACH P GOEDICKE K	1995	Surface and Coatings Technology1995，75，1：	1
	10	Simultaneous determination of CFC-11,CFC-12 and CFC-113 in seawater samples using a purge and trap gas-chromatographic system显示文摘	MASSOLO S RIVARO P FRACHE R	2009	Talanta2009，80，2：	1
	11	Advantageous possibilities, design aspects and technical use of double-ring magnetron sputter sources 显示文摘	Frach P Goedicke K	1995	Surface and Coatings technology1995，7475，：	1
	12	High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications 显示文摘	Frach P Fahland M Gnehr W M	2003	Thin Solid Films2003，445，：	1
	13	Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation 显示文摘	FRACH P GLOI3 D METZNER C	2006	Vacuum2006，80，7：	1
	14	High rate deposition of tindoped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems 显示文摘	Ohno S Kawaguchi Y Miyamura A Sato Y Song P K Yoshikawa M Frach P Shigesato Y	2006	Science and Technology of Advanced Materials2006，7，1：	1

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