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8篇 您的检索式：作者名="Flaud V"

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		题名	作者	年代	出处	被引量
	1	Effects of processing parameters on the properties of tantalum nitride thin flms deposited by reactive sputtering显示文摘	Nazon J Sarradin J Flaud V	2007	J Alloys Compd2007，430，：	1
	2	The HITRAN 2008 molecular spectroscopic database 显示文摘	Rothman L S Gordon I E Barbe A ChrisBenner D Bernath P F Birk M Boudon V Brown L R Campargue A Champi-on J P Chance K Coudert L H Dana V Devi V M Fally S Flaud J M Gamache R R Goldman A Jacquemart D Klein er I Lacome N Lafferty W J Mandin J Y Massie S T Mikhailenko S N Miller C E Moazzen A N Naumenko 0 VNikitin A V Orphal J Perevalov V I Perrin A Predoi C A Rinsland C P Rotger M ime kovd M Smith M A H Sung K Tashkun S A Tennyson J Toth R A Vandaele A C Vander A J	2009	Journal of Quantitative Spectroscopy Radiative Transfer2009，110，：	1
	3	Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering 显示文摘	NAZON J SARRADIN J FLAUD V	2008	J Alloys Compd2008，464，12：	1
	4	Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering显示文摘	NAZON J SARRADIN J FLAUD V	2008	J Alloy Comp2008，464，12：	1
	5	The HITRAN molecular spectroscopic database:edition of 2000 including updates through 2001显示文摘	Rothman LS Barbe A Chris Benner D Brown LR Camy-Peyret C Carleer MR Chance K Clerbaux C Dana V Devi VM Fayt A Flaud J-M Gamache RR Goldman A Jacquemart D Jucks KW Lafferty WJ Mandin J-Y Massie ST Nemtchinov V Newnham DA Perrin A Rinsland CP Schroeder J Smith KM Smith MAH Tang K Toth RA Vander Auwera J Varanasi P Yoshino K	2003	JQSRT2003，82，：	1
	6	Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering显示文摘	NAZON J SARRADIN J FLAUD V	2008	Journal of Alloys and Compounds2008，464，12：	1
	7	Effects of processing parameters on the properties of tantalum ni- tride thin films deposited by reactive sputtering 显示文摘	NAZON J SARRADIN J FLAUD V	2008	Journal of Alloys and Compounds2008，464，12：	1
	8	Effects of processingparameters on the properties of tantalum nitride thin films deposited byreactive sputtering显示文摘	NAZON J SARRADIN J FLAUD V	2008	J Alloys Compd2008，464，12：	1

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