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3篇 您的检索式:作者名="Bram Hoex"
    题名 作者 年代 出处 被引量
1Atomic layer deposition enabling higher efficiency solar cells:A review显示文摘Atomic layer deposition(ALD)can synthesise materials with atomic-scale precision.The ability to tune the material composition,film thickness with excellent conformality,allow low-temperature processing,and in-situ real-time monitoring makes this technique very appealing for a wide range of applications.In this review,we focus on the application of ALD layers in a wide range of solar cells.We focus on industrial silicon,thin film,organic and quantum dot solar cells.It is shown that the merits of ALD have already been exploited in a wide range of solar cells at the lab scale and that ALD is already applied in high-volume manufacturing of silicon solar cells.MdAnower Hossain Kean Thong Khoo Xin Cui Geedhika K Poduval Tian Zhang Xiang Li Wei Min Li Bram Hoex 2020Nano Materials Science2020,2,3:3
2POCl3 diffusion for industrial Si solar cell emitter formation显示文摘POCl 3 散开当前是为工业 n 类型 emitter 制造的事实上的标准方法。在这研究,我们在场 emitter 形成和电的性能上的下列处理参数的影响:免职气体流动比率,免下车餐馆温度和持续时间,免下车餐馆 O 2 流动率,和热氧化温度。由在做侧面和再结合活动的 emitter 上显示出他们的影响,我们为改进工业 POCl 3 试管提供全面策略传播 emitters。Hongzhao LI Kyung KIM Brett HALLAM Bram HOEX Stuart WENHAM Malcolm ABBOTT 2017Frontiers in Energy2017,11,1:1
3Special issue: Technologies for future high-efficiency industrial silicon wafer solar cells显示文摘Dr. Wenzhong SHEN Dr. Bram HOEX 2017Frontiers in Energy2017,11,1:0
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