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1Unraveling the Effect of Solvent Additive and Fullerene Component on Morphological Control in Organic Solar Cells显示文摘The manipulation of the morphology of the active layers is crucial for improving the performance of organic photovoltaic(OPV)devices. In particular, the development of non-fullerene acceptors(NFAs) has led to a large number of new materials with more complex interactions. Therefore, the investigation on the morphology control mechanism is the key aspect in providing guidance for material design and device optimization. In this study, the film morphology optimization using 1,8-diiodooctane(DIO) additive and a ternary fullerene acceptor strategy have been carried out based on the PCE10:ITIC blends. It is seen that suitable amount of DIO helps to increase the crystallization of the blended thin film. However, excessive DIO elevates the crystallization-induced phase separation and the domain size can exceed the exciton diffusion length, leading to efficiency drop. The addition of fullerene acceptor can improve the carrier transport of the blends, and its presence could retard the excessive phase separation induced by DIO additive. Under the joint optimization of the solvent additive and PCBM acceptor,the film morphology achieves a balance between crystallization and phase separation scales, the exciton diffusion and carrier transport are also optimized, and the short-circuit current(JSC) and fill factor(FF) of the device can be improved significantly.Lei Zhu Quan-Zeng Zhang Hong Ding Ming Zhang Xiao-Nan Xue Wen-Kai Zhong Zi-Chun Zhou Jin-Qiu Xu Wei Feng Ye-Cheng Zou Yong-Ming Zhang Feng Liu 2022Chinese Journal of Polymer Science2022,40,12:0
2基于P3HT∶PC_(61)BM活性层形貌调控的倒置有机太阳电池显示文摘为了提高聚3-己基噻吩(P3HT)∶富勒烯衍生物6,6-6苯基-C61-丁酸甲酯(PCBM)体系的倒置有机太阳电池的性能,探究了活性层的旋涂速度(厚度)、热退火时间和热退火前处理对其形貌、结晶度以及对器件性能的影响。结果表明,当活性层旋涂速度为900 r/min时,其厚度约为220 nm,对活性层进行10 min的热退火处理后,该器件的能量转换效率(PCE)最高,为2.71%。适当延长活性层的退火时间能提高其结晶度,使活性层形成更好的互穿网络结构,退火时间延长至20 min时,器件的PCE提升到3.13%。在活性层热退火处理前进行适当时间的静置或溶剂退火,能使P3HT分子排列更为有序,可以进一步提高器件的性能。当活性层静置24 min或溶剂退火30 min后,再热退火处理20 min,器件的PCE分别提升到3.42%和3.59%。陈达华 张奥 张坤 侯晓雅 张婕 2022微纳电子技术2022,59,9:0
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