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| 1 | 光学邻近效应矫正(OPC)技术及其应用显示文摘随着集成电路设计和制造进入超深亚微米(VDSM)阶段,特征尺寸已经接近甚至小于光刻工艺中所使用的光波波长,因此光刻过程中,由于光的衍射和干涉现象,实际硅片上得到的光刻图形与掩膜版图形之间存在一定的变形和偏差,光刻中的这种误差直接影响电路性能和生产成品率.为尽量消除这种误差,一种有效的方法是光学邻近效应矫正(OPC)方法.目前由于OPC矫正处理时间过长,产生的文件大小呈指数级增长,使掩膜版的制造成本成倍地增加.文中首先针对OPC矫正技术进行了深入研究,提出了具有图形分类预处理功能的自适应OPC矫正技术,将芯片图形按其对性能的影响分为关键图形与一般图形,对两类图形采用不同的容差,提高了OPC处理效率.其次,提出并实现了图形分段分类的基于模型的OPC矫正算法,在保证矫正精度的同时提高了矫正的效率.提出了具有通用性、简洁性和全面性的OPC矫正规则,在此基础上实现了规则库的自动建立和规则库的查找与应用,实现了效率高、扩展性强的基于规则的掩膜版矫正算法.算法对规则数据进行有效地描述、存储和处理,提高了光刻矫正技术实际应用效率.第三,设计实现了高效、高精度的光学邻近效应矫正系统MR-OPC,系统综合应用了基于规则的OPC矫正技术和基于模型的OPC矫正技术,很好地解决了矫正精度和矫正效率之间的矛盾,取得了最佳的矫正优化结果. | 蔡懿慈 周强 洪先龙 石蕊 王旸 | 2007 | 中国科学(E辑)2007，37，12： | 3 |
| 2 | Application of optical proximity correction technology显示文摘As process technology scales down to very deep sub-micron(VDSM)in semicon- ductor manufacturing technology,intrinsic size becomes close to or even shorter than the wavelength used for optical lithography.Thus,some distortions and de- formations are introduced by optical proximity effects(OPE)mainly caused by the diffraction and interference of exposure light when layout patterns on a mask are transcribed to a wafer,which influence on the yield and performance of IC circuit.In order to compensate for the deformations,optical proximity correction(OPC)is the most commonly used methodology.Presently,the OPC method is to use a unitary toleration on the whole chip layer,which makes the run time of OPC algorithm longer,causes the size of GDSII files to follow exponential growth,and results in the cost of making mask grow immensely.Firstly,this paper proposes a self- adaptation OPC method with preprocessing function of patterns classification. According to the need of the correction precision,the OPC system divides patterns corrected into two groups with different toleration:critical patterns and general patterns,which enhance the efficiency of the OPC approach.Secondly,a model-based OPC method is presented based on pattern subsection and classifi- cation,which keeps the precision of the correction as well as enhances the effi- ciency.We also propose a rule-based OPC method with general,concise and com- plete correction rules,and achieve automatic-built rules-based and its looking-up. Thirdly,we also implement an OPC system,called MR-OPC;the MR-OPC system integrates both rule-based OPC and model-based OPC into a whole,so it can solve the confliction between the efficiency and precision.Experimental results show that the MR-OPC system we suggested has advantages of the efficiency and ex- pansibility. | CAI YiCi ZHOU Qiang HONG XianLong SHI Rui WANG Yang | 2008 | Science in China(Series F)2008，51，2： | 0 |
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