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		题名	作者	年代	出处	被引量
	1	Matrix addressing for organic electroluminescent displays显示文摘	Pribat D Plais F	2001	Thin Solid Films2001，383，：	1
	2	Matrix addressing for organic electroluminescent displays显示文摘	D Pribat F Plais	2001	Thin Solid Films2001，383，12：	1
	3	Matrix addressing for organic electroluminescent displays 显示文摘	Pribat D Plais F	2001	Thin Solid Films2001，383，：	1
	4	Matrix addressing for organic electroluminescent displays 显示文摘	Pribat D Plais F	2001	Thin Solid Films2001，383，1：	1
	5	Compact analyticalphysical-based model of LTPS TFT for active matrix dis-plays addressing circuits simulation and design显示文摘	Benzarti W Plais F Luca A D	2004	IEEE Transactions on Electron Devices2004，51，3：	1
	6	Experimental model of posterolateral spinal arthrodesis in sheep 显示文摘	Guigui P Plais PY Flautre B	1994	Spine1994，19，24：	1
	7	Matrix addressing for organic electroluminescent display 显示文摘	Pribat D Plais F	2001	Thin Solid Films2001，383，12：	1
	8	Matrix addressing for organic electrolumines-cent displays 显示文摘	PRIBAT D PLAIS F	2001	Thin Solid Films2001，383，12：	1
	9	Matrix addressing for organic electroluminescent displays显示文摘	Pribat D Plais F	2001	Thin Solid Films2001，383，12：	1
	10	Matrix addressing for organic electroluminescent displays显示文摘	Plais F	2001	Thin Solid Films2001，383，：	1
	11	Matrix addressing for organic electroluminescent displays显示文摘	Pribat D Plais F	2001	Thin Solid Films2001，383，：	1
	12	Matrix addressing for organic electrolumi- nescent displays显示文摘	Prbat D Plais F	2001	Thin solid film2001，38，：	1
	13	Matrix addressing for organic electroluminescent displays 显示文摘	Pribat D Plais F	2001	Thin Solid Films (S0040-6090)2001，383，：	1
	14	Experimental model ofposterolateral spinal arthrodesis in sheep 显示文摘	Guigui P Plais PY Flautre B	1994	Spine1994，19，24：	1
	15	Matrix Addressing for Organic Electroluminescent Displays显示文摘	Pribat D Plais F	2001	Thin solid films2001，383，：	1
	16	Influence of insulator-Deposited Wall on PlasmaBias Characteristics显示文摘If a plasma system, made of metal and grounded, is used for insulator material deposition, the environment of the plasma will be changed, i.e., the grounded wall will become isolated. Furthermore, the electrical characteristic measurement of the plasma and the bias properties will be largely affected by the wall effect. In this paper we investigate how the electrical characteristics evolve via the insulator deposition in a DECR (Distributed Electron Cyclotron Resonance) plasma system. An equivalent circuit of the wall effects is proposed and used to qualitatively explicate the observed phenomenon about the I-V measurement during the evolution. At the end of the paper, after having understood the properties of the wall effect, an experiment about a plasma anodic oxidation are successfully conducted in the insulator deposition system.	江南 F. Plais	2000	Plasma Science and Technology2000，2，1：	0

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