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137篇 您的检索式:期刊名="Surface Film Technology"
    题名 作者 年代 出处 被引量
1Origin of electrical property distribution on the surface of ZnO: Al films prepared by magnetron sputtering 显示文摘Minami T Miyata T Yamamoto T 2000Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films2000,18,:1
2The influence of preparation conditions on the optical properties of titanium nitride based solar control films显示文摘Georgson M Roos A Ribbing C G 1991Journal of Vacuum Science & Technology A (Vacuum Surfaces and Films)1991,9,4:1
3Chemical doping of Hg Cd Te by molecular‐beam epitaxy显示文摘Wu O K Kamath G S Radford W A 1990Journal of Vacuum Science&Technology A Vacuum Surfaces&Films1990,8,2:1
4Cryosorption of helium on argon frost in Tokamak Fusion Test Reactor neutral beamlines 显示文摘Kampersehroer J H Cropper M B Dylla H F 1990Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films1990,8,3:1
5Etleets of target microstructure on aluminum alloy sputtered thin fihn properties 显示文摘Bailey R S 1992Journal of Vacuum Science & Technology A: Vacumn Surfaces and Films1992,10,4:1
6Effect of ion bombardment and substrate orientation on structure and properties of titanium nitride films deposited by unbalanced magnetron sputtering 显示文摘Guruvenket S Mohan Rao G 2002Vacuum Science and Technology Part A: Vacuum Surfaces and Films2002,20,3:1
7Pulsed DC magnetron discharge for high-rate sputtering of thin films显示文摘Musil J Lestina J Vlcek J 2001Journal of Vacuum Science and technology PartA: Vacuum Surfaces and films2001,19,2:1
8Pulsed dc magnetron discharge for high-rate sputtering of thin films显示文摘MUSIL J LESTINAL J VLCEK J 2001Journal of Vacuum Science and Technology Part A: Vacuum Surfaces and Films2001,19,2:1
9Helium sticking coefficient on cryopanels coated by activated carbon显示文摘Ozdemir I Perinic D 1998Journal of Vacuum Science & Technology A:Vacuum Surfaces and Films1998,,:1
10Application of pulsed-laser deposition technique for cleaning a GaAs surface and for epitaxial ZnSe film growth 显示文摘Ryu Y R Zhu S Han S W 1998Journal of Vacuum Science & Technology A:Vacuum Surfaces and Films1998,16,5:1
11Microstructural evolution and preferred orientation change of radiofrequeney-magnetron sputtered ZnO thin films 显示文摘Lee Y E Lee J B Kim Y J 1996Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films1996,14,:1
12Effect of heat on the pumping performance of cryopump显示文摘Cheng H P Shen Y H 2006Journal of Vacuum Science& Technology A:Vacuum Surfaces and Films2006,,:1
13Stress relief of basal orientation zinc oxide thin films by isotherrnal annealing显示文摘GAWLAK C J AITA C R 1983Journal of Vacuum Science &Technology A:Vacuum Surfaces and Films1983,1,2:1
14Properties of a-Si:H films deposited from silane diluted with hydrogen and helium using modified pulse plasma technique显示文摘Mukherjee C Anandan C Seth T 1999Journal of Vacuum Science & Technology A:Vacuum Surfaces and Films1999,17,6:1
15Deposition, microstructure, and properties of nanocrystalline Ti(C,O,N) coatings显示文摘Ruppi S Larsson A 2003Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films2003,21,1:1
16Inteffacial reaction effect on the ohmic properties of a Pt/Pd/Au contact on p-type GaN 显示文摘Kim H K Adesia I Seong T Y 2004Journal of Vacuum Science & Technology A(Vacuum Surfaces and Films)2004,22,4:1
17Fabrication of bismuth nanowires with a silver nanocrystal shadowmask显示文摘Choi S H Wang K L Leung L S 2000Journal of Vacuum Science and Technology Part A:Vacuum Surfaces and Films2000,18,4:1
18Deposition of Titanium Carbide Films from Mixed Carbon and Titanium Plasma Streams显示文摘Delplancke-Ogletree M-P Monteiro O R 1997Journal of Vacuum Science&Technology A:Vacuum Surfaces and Films1997,15,4:1
19High aspect ratio SiOzetching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluo- romethylether 显示文摘Chinzei Y Feurprier Y Ozawa M 2000Journal of Vacuum Science & Technology A: Vacuum Surface and Films2000,18,1:1
20Study of the performance of a group of quadrupole mass spectrometry显示文摘AUSTIN W E LECK J H BATEY J H 1992Journal of Vacuum Science Technology A-Vacuum Surfaces and Films1992,10,6:1
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